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Optical measurement for particle production in vacuum interrupter

机译:用于真空灭弧室中颗粒产生的光学测量

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Vacuum interrupters have some merits such as size and maintenance. They have been used widely up to 72 kV, and expected to be used in the higher voltage class. To improve their dielectric performance, it is necessary to clarify vacuum breakdown phenomena. Micro particles are not negligible especially concerning vacuum interrupters used in the high voltage class. Therefore, the authors have developed optical measuring system for particle behavior in vacuum. In this paper, the authors investigated the causes of particle production and their influence on dielectric performance. The authors focused on two different causes of particle production as follows: (a) contact melting during current interruption, (b) mechanical damage of contacts during closing operation. Concerning “(a) contact melting during current interruption”, it turned out that particles generated during the current interruption are able to be significantly suppressed by current conditioning. Concerning “(b) mechanical damage of contacts during closing operation”, it turned out that some particles were generated by the high-velocity closing operation. The breakdown voltage just after the mechanical damage was about 70% of the conditioning voltage. Closing velocity would have some influence on particle production.
机译:真空灭弧室具有一些优点,例如尺寸和维护。它们已被广泛用于高达72 kV的电压,并有望用于更高的电压等级。为了提高其介电性能,有必要弄清真空击穿现象。微粒是不可忽略的,特别是对于高压等级中使用的真空灭弧室。因此,作者开发了用于真空中颗粒行为的光学测量系统。在本文中,作者研究了产生颗粒的原因及其对介电性能的影响。作者集中研究了两种不同的颗粒产生原因:(a)电流中断时触头熔化,(b)闭合操作时触头的机械损坏。关于“(a)在电流中断期间的接触熔化”,发现电流中断期间产生的颗粒能够通过电流调节被显着地抑制。关于“(b)闭合操作过程中触点的机械损坏”,事实证明,高速闭合操作会产生一些颗粒。机械损坏后的击穿电压约为调节电压的70%。闭合速度将对颗粒产生产生一些影响。

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