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Affect of magnetic field variation in ECR plasma discharge unit on polymer treatments

机译:ECR等离子放电单元中磁场变化对聚合物处理的影响

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Technology of argon plasma sputtering is presented, and a coil current (magnetic flux) variation effects on silicone based polymer surface has been tried to figure out. Silicone pieces were interacted with Ar plasma discharge under two different coil current values of 150A and 100A which produce fluxes of 87.5mTesla and 50mTesla at the centre of ECR discharge unit, respectively. The purpose of this research effort is to characterize and understand how coil current changes the surface capability of discharge unit while causing a change in ion-to-neutral ratio which is one the fundamental control parameters for processing efficiency. A requirement of the substrate not suffer any damage is also achieved. Polymer samples were exposed to discharge separately for different flux rate, and the results were monitored with SEM. Samples were kept through the treatment by 5 minutes after plasma initialization.
机译:提出了氩等离子体溅射技术,并试图找出线圈电流(磁通量)对有机硅基聚合物表面变化的影响。硅片与Ar等离子体放电在150A和100​​A的两个不同线圈电流值下相互作用,在ECR放电单元的中心分别产生87.5mTesla和50mTesla的通量。这项研究工作的目的是表征和了解线圈电流如何改变放电单元的表面能力,同时引起离子中性比的变化,离子中性比是处理效率的基本控制参数之一。还实现了对基板不遭受任何损坏的要求。将聚合物样品分别以不同的通量率暴露于放电,然后用SEM监控结果。在血浆初始化后5分钟将样品保持通过处理。

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