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Review: Analog design methodologies for reliability in nanoscale CMOS circuits

机译:综述:纳米级CMOS电路可靠性模拟设计方法

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In modern CMOS technology, local electrical stress has substantially increased as device geometries scaled down more aggressively compared to supply voltages. As a result, time-dependent degradation mechanisms (aging phenomena) became an important performance problem, which leads to a considerable lifetime reduction in manufactured integrated circuits. Combination of these aging phenomena with process variations has made reliability a major design objective. In analog circuits, different approaches have been proposed to mitigate the performance challenges related to device reliability. This paper discusses aging in CMOS technology and reviews reliability-aware analog circuit design methodologies for nanoscale circuits.
机译:在现代CMOS技术中,当设备几何形状比较与电源电压相比,局部电力应力大大增加。结果,时间依赖性降解机制(老化现象)成为重要的性能问题,这导致制造的集成电路的相当长的寿命减少。这些老化现象与过程变化的组合使得可靠性成为一个主要的设计目标。在模拟电路中,已经提出了不同的方法来减轻与设备可靠性相关的性能挑战。本文讨论了CMOS技术的老化,并考退了纳米级电路的可靠性感知模拟电路设计方法。

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