Process for the Φ130 sapphire window element with long distance and high resolution

摘要

With the process test for the choice of materials, the test materials and the molds, the abrasives, the temperature and the different machining process monitoring parameters of the polishing machine, the process method and the quality control technology were figured out for the Φ130 sapphire window element with long distance and high resolution (hereinafter referred to as window element), meantime, the optimum process condition was determined to machine the element. The results were that the high resolution imaging window was processed with the surface roughness R_a of 0.639nm, the transmission distortion of λ/10 (λ=632.8nm), the parallel error of 5", the resolution of 1.47" and the focal length of 5 km, which can satisfy the imaging requirements better for the military photoelectric device for sapphire window with long distance and high resolution.