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A bandgap voltage reference structure with improved temperature coefficient by eliminating the β effect

机译:通过消除β效应改善温度系数的带隙电压基准结构

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The proposed structure utilizes two transistors to generate a PTAT and a CTAT currents, then sums them up according to certain proportion in the surrounding topological structure of the triodes, finally builds the reference current which is temperature-independent and β-independent. The performance has been verified and consolidated through both simulate and tap-out measurement. The temperature coefficient of the fabricated chip is 17.2ppm V/°C during the temperature from -40°C to +120°C. It is proposed to improve the reliability of the CMOS process bandgap voltage reference circuit.
机译:所提出的结构利用两个晶体管产生PTAT和CTAT电流,然后在三极管周围的拓扑结构中按一定比例将它们相加,最终建立与温度和β无关的参考电流。该性能已通过仿真和抽头测量进行了验证和合并。在-40°C至+ 120°C的温度范围内,制成的芯片的温度系数为17.2ppm V /°C。提出提高CMOS工艺带隙电压基准电路的可靠性。

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