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The effect of current stressing and external loading on the growth of tin whiskers

机译:电流应力和外部负载对锡晶须生长的影响

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Different current density and external loading were applied on pure Sn-plated surfaces to evaluate the effects of service conditions on the growth of tin(Sn) whiskers. The samples were aged at room temperature with an induced current density range of 0.1~0.5×10A/cm. Whiskers were found after 720 hrs aged at the room temperature and the maximum length was 2.0μm. While tin whiskers were much longer after current stress aged at the same conditions. With increased current density, intermetallic compounds (IMCs) grew at the interface between the Sn finish and Cu substrate. Accordingly, various lengths of columnar and bent whiskers were observed under all current stressing conditions for 240 hrs. At the same conditions, the higher current density induced longer whiskers. The current density effect on tin whisker growth at the anode is greater than cathode. The length of the whisker is 8.0μm on the surface of the sample with 0.5×10A/cm current density, which is about 4 times longer than the one aged at room temperature for 720 hrs without current stressing. In addition, these samples after current stressing were then applied alternating external force loading, the growth of tin whiskers can be significantly promoted.
机译:在纯锡镀层表面施加不同的电流密度和外部负载,以评估使用条件对锡(Sn)晶须生长的影响。样品在室温下老化,感应电流密度范围为0.1〜0.5×10A / cm。在室温下老化720小时后发现晶须,最大长度为2.0μm。尽管在相同条件下电流应力老化后锡晶须要长得多。随着电流密度的增加,金属间化合物(IMC)在Sn涂层和Cu衬底之间的界面处生长。因此,在所有当前的应力条件下观察了240小时的各种长度的圆柱状和弯曲的晶须。在相同条件下,较高的电流密度会引起较长的晶须。电流密度对阳极上锡晶须生长的影响大于阴极。在电流密度为0.5×10A / cm的样品表面上,晶须的长度为8.0μm,比在室温下老化720小时而不产生电流应力的晶须的长约4倍。此外,在电流应力作用下,这些样品随后施加交替的外力载荷,锡晶须的生长可以得到显着促进。

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