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Nanotribological behaviors of friction-induced hillocks on monocrystalline silicon

机译:单晶硅摩擦诱导小丘的纳米艺术行为

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With an atomic force microscope, friction and wear behaviors of the friction induced hillocks on monocrystalline silicon were investigated. With the increase of normal load from one to twelve microNewtown, the friction force on silicon substrate showed a sharp increase at eight microNewtown, while the friction force on the hillocks kept a stably linear increase. Since no scratch damage was detected on the hillock below a contact pressure of ten point three gigaPascal, the friction induced hillocks on silicon can withstand the typical contact and sliding in dynamic devices. It was also noted that the friction induced hillock presented anisotropic friction and wear behaviors during scratching. The sliding parallel to the scanning direction for producing the hillock can reduce the friction in dynamic devices. This study can shed new light on potential application of the friction induced nanostructures.
机译:采用原子力显微镜,研究了摩擦诱导的小山上硅硅的摩擦和磨损行为进行了研究。随着常规载荷从一到十二微长脉的增加,硅基衬底上的摩擦力在八微长尺寸下显示出急剧增加,而丘袋上的摩擦力保持稳定的线性增加。由于在丘陵上没有检测到十点三兆卡帕斯卡的接触压力下的丘脑上没有检测到划痕损伤,因此硅上的摩擦诱导的小丘可以承受动态装置的典型接触和滑动。还有人指出,在刮擦期间,摩擦诱导的小丘呈现各向异性摩擦和磨损行为。平行于扫描方向制造小丘的滑动可以减少动态设备中的摩擦。本研究可以揭示摩擦诱导纳米结构的潜在应用。

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