首页> 外文会议>Conference on Design of Circuits and Integrated Systems >Complementary tunnel gate topology to reduce crosstalk effects
【24h】

Complementary tunnel gate topology to reduce crosstalk effects

机译:互补隧道门拓扑,以减少串扰效应

获取原文

摘要

Tunnel transistors are one of the most attractive steep subthreshold slope devices which are being investigated to overcome power density and energy inefficiency exhibited by CMOS technology. There are design challenges associated to their distinguishing characteristic which are being addressed. In this paper the impact of the non-symmetric conduction of tunnel transistors (TFETs) on the speed of TFETs circuits under crosstalk is analyzed and a novel topology for complementary tunnel transistors gates, which mitigates the observed performance degradation without power penalties, is described and evaluated.
机译:隧道晶体管是正在研究的最具吸引力的陡峭亚阈值斜面装置之一,以克服CMOS技术呈现的功率密度和能量低效率。与他们所解决的特征有关的设计挑战。在本文中,分析了隧道晶体管(TFET)对串扰下的TFET电路速度的影响,并对互补隧道晶体管栅极进行了新颖的拓扑,其缩写了所观察到的性能下降,而且评估。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号