A volume diagnosis method for identifying systematic faults in lower-yield wafer occurring during mass production

摘要

This work focuses on volume diagnosis for identifying systematic faults in lower-yield wafers, whose yields are lower than baseline level due to systematic faults during mass production. We develop a model-based volume diagnosis method. To diagnose accurately using the fail data with one lower-yield wafer, we apply modeling techniques for handling pseudo-faults and random faults in the fail data. Experimental results show our method's efficiency; we succeeded in identifying the failure layer for 20/22 data sets with actual lower-yield wafers.