【24h】

Characteristics of double-gate a-IGZO TFT

机译:双栅极a-IGZO TFT的特性

获取原文

摘要

A double-gate (DG) a-IGZO TFT with separate bottom-gate and top-gate is fabricated and electrically characterized. It is shown that the double-gate device has a steeper sub-threshold swing, a larger carrier mobility, and a driving current 2.4 times larger than the conventional single-gate device. Due to the lowered vertical electric field across the channel region, a negligible V shift is observed for the double-gate device under negative gate bias stress. Moreover, the dynamic threshold voltage effect has also been demonstrated due to the separate two gates in the TFT.
机译:制作了具有单独底栅和顶栅的双栅(DG)a-IGZO TFT,并对其进行了电气特性分析。结果表明,与传统的单栅极器件相比,双栅极器件具有更陡峭的亚阈值摆幅,更大的载流子迁移率和2.4倍的驱动电流。由于跨沟道区域的垂直电场降低,在负栅极偏置应力下,双栅极器件的V位移可忽略不计。此外,由于TFT中有两个独立的栅极,因此也已经证明了动态阈值电压效应。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号