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Novel MRF fluid for Ultra-Low Roughness optical surfaces

机译:用于超低粗糙度光学表面的新型MRF流体

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Over the past few years there have been an increasing number of applications calling for ultra-low roughness (ULR) surfaces. A critical demand has been driven by EUV optics, EUV photomasks, X-Ray, and high energy laser applications. Achieving ULR results on complex shapes like aspheres and X-Ray mirrors is extremely challenging with conventional polishing techniques. To achieve both tight figure and roughness specifications, substrates typically undergo iterative global and local polishing processes. Typically the local polishing process corrects the figure or flatness but cannot achieve the required surface roughness, whereas the global polishing process produces the required roughness but degrades the figure. Magnetorheological Finishing (MRF) is a local polishing technique based on a magnetically-sensitive fluid that removes material through a shearing mechanism with minimal normal load, thus removing sub-surface damage. The lowest surface roughness produced by current MRF is close to 3 A RMS. A new ULR MR fluid uses a nano-based cerium as the abrasive in a proprietary aqueous solution, the combination of which reliably produces under 1.5A RMS roughness on Fused Silica as measured by atomic force microscopy. In addition to the highly convergent figure correction achieved with MRF, we show results of our novel MR fluid achieving <1.5A RMS roughness on fused silica and other materials.
机译:在过去的几年中,越来越多的应用要求使用超低粗糙度(ULR)表面。 EUV光学器件,EUV光掩模,X射线和高能激光应用推动了关键需求。使用常规抛光技术在非球面和X射线反射镜等复杂形状上获得ULR结果极具挑战性。为了达到严格的图形和粗糙度规格,通常对基材进行迭代的整体和局部抛光工艺。通常,局部抛光工艺可校正图形或平面度,但不能达到所需的表面粗糙度,而整体抛光工艺可产生所需的粗糙度,但会使图形劣化。磁流变精加工(MRF)是一种基于磁敏流体的局部抛光技术,该流体通过剪切机制以最小的法向载荷除去材料,从而消除了表面下的损坏。电流MRF产生的最低表面粗糙度接近3 A RMS。新型ULR MR流体在专有水溶液中使用纳米铈作为磨料,通过原子力显微镜测量,两者的结合在熔融石英下在1.5A RMS粗糙度下可可靠地产生。除了通过MRF实现高度收敛的图形校正外,我们还展示了我们的新型MR流体在熔融石英和其他材料上达到<1.5A RMS粗糙度的结果。

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