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Fabrication of polymer-based multimode interference optical splitters by UV-based soft imprint lithography

机译:通过基于UV的软印记光刻制备基于聚合物的多模干扰光学分离器

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A polymer-based multimode interference (MMI) optical splitter chip has been fabricated through UV-based soft imprint lithography (Soft UV-NIL) technique. Propagation loss and bending loss are considered during the chip design in order to decrease the insertion loss. UV curable fluorinated acrylate resin is used due to its low material absorbing loss. 1 ×4 cascaded MMI splitter is fabricated and measured at 1550 nm optical wavelength and an average 12.38 dB insertion loss is obtained together with an 1.23 dB uniformity.
机译:通过基于UV的软压印光刻(软UV-NIL)技术制造了基于聚合物的多模干扰(MMI)光分离器芯片。在芯片设计期间考虑了传播损耗和弯曲损耗,以降低插入损耗。由于其低材料吸收损失,使用UV可固化氟化丙烯酸酯树脂。 1×4级联MMI分离器制造并在1550nm光波长下测量,并且平均12.38dB插入损耗与1.23dB均匀性一起获得。

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