We present the measurements of the fluctuating component of the flux(vortex)-flow voltage V(t) about the average in the low-temperature(T) vortex-liquid phase of amorphous MoxSi1–x films. For the thick film V(t) and broad-band noise originating from the vortex motion is clearly visible in the quantum-vortex-liquid phase, where the amplitude of V(t) is pronounced and the distribution of V(t) is anomalously asymmetric, implying the unstational vortex motion. For the thin film the similar unusual vortex motion is observed in nearly the same reduced-T regime. Physical origin responsible for the phenomena is discussed.
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