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Abnormal electrical capacitance behavior of VO2-films-based microstructures near semiconductor-to-metal phase transition

机译:VO 2薄膜基微结构在半导体到金属相变附近的异常电容行为

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Abnormal behavior of electrical capacity was investigated for planar microstructures consisting of VO2 films grown on sapphire and metal (Ni/Au) electrodes. At heating from 293K to 350K abrupt change in electrical capacitance of microstructures was revealed by 7 orders of magnitude. Abnormally high electrical capacity is supposed to cause by metal clusters formation with divaricated surface in VO2 films near semiconductor-to-metal phase transition.
机译:对于由在蓝宝石和金属(Ni / Au)电极上生长的VO2薄膜组成的平面微结构,研究了电容的异常行为。在从293K加热到350K时,微结构的电容突然变化了7个数量级。异常高的电容量被认为是由于在半导体到金属的相变附近的VO2薄膜中形成具有分叉表面的金属簇而引起的。

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