Development of a Integrated Dry/Wet Hybrid Cleaning System

摘要

We have demonstrated a dry/wet (or wet/dry) hybrid system. It has been shown that the hybrid system can overcome the conventional dry clean issues, such as the etch rate fluctuation, the fluorine residue and cross-contamination, the complicate integration sequence, the low throughput, etc. Therefore the hybrid system, based on in-situ wet clean module, can be extended to various applications. Moreover, the throughput could be considerably increased by a newly developed hybrid system with the capability of adding 4 wet clean modules(figure 8).