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Er-doped Si-based electroluminescent capacitors: Role of different host matrices on the electrical and luminescence properties

机译:掺硅基电致发光电容器:不同基质对电和发光性能的作用

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We report on the electrical and electroluminescence properties of four different layers based on Er-doped silicon oxide (or nitride) with (or without) silicon nanocrystals. Electrical measurements have allowed us to identify that samples composed by silicon nitride matrices present a Poole-Frenkel-type conduction, whereas those ones formed by silicon oxide matrices show a Fowler-Nordheim tunneling mechanism. In addition, infrared power efficiency at 1.54 μm has shown to be two orders of magnitude larger for Er-doped silicon oxide layers than for Er-doped silicon nitrides. Moreover, an interesting trade off between power efficiency at 1.54 μm and device operation lifetime has been observed by comparing both Er-doped silicon oxides and Er-doped silicon nitride layers.
机译:我们报告了基于具有(或不具有)硅纳米晶体的掺Er的氧化硅(或氮化物)的四个不同层的电和电致发光特性。电学测量使我们能够识别出由氮化硅基体组成的样品呈现出Poole-Frenkel型导电性,而由氧化硅基体形成的样品则具有Fowler-Nordheim隧穿机理。另外,对于掺Er的氧化硅层,在1.54μm的红外功率效率已经显示出比掺Er的氮化硅层大两个数量级。此外,通过比较掺Er的氧化硅层和掺Er的氮化硅层,可以观察到1.54μm的功率效率与器件工作寿命之间的有趣折衷。

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