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Breakdown characteristics of CuCr Electrode after electron beam treatment and current conditioning treatment in vacuum

机译:真空中电子束处理和电流调节处理后CuCr电极的击穿特性

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For development of high-voltage equipment such as vacuum circuit breakers, it is very important to improve their dielectric breakdown characteristics in a vacuum. It is thus necessary to clarify the breakdown mechanism in a vacuum. It is well-known that these characteristics are influenced by the electrode material and its surface condition and the breakdown voltage is increased by current conditioning and electron beam irradiation [1] [2] [3] . This paper presents breakdown characteristics and observations of a cross-section after electron beam treatment and current conditioning treatment. The results are compared with those for only electron beam treatment and only current conditioning treatment. It is shown that the breakdown voltage of a CuCr electrode both treatments is higher than that achieved by only one of them. Treatment combining electron beam and current conditioning forms a CuCr layer with small Cr grains. The breakdown voltage after both these treatments is increased by the formation of this layer.
机译:对于开发诸如真空断路器的高压设备,在真空中改善其介电击穿特性非常重要。因此有必要在真空中阐明击穿机理。众所周知,这些特性会受到电极材料及其表面状况的影响,并且通过电流调节和电子束辐照会增加击穿电压[1] [2] [3]。本文介绍了电子束处理和电流调节处理后的击穿特性以及横截面的观察结果。将结果与仅电子束处理和仅电流调节处理的结果进行比较。结果表明,两种处理方式的CuCr电极的击穿电压均高于仅通过其中一种处理所达到的击穿电压。电子束和电流调节相结合的处理形成了具有小的Cr晶粒的CuCr层。这两个处理之后的击穿电压通过该层的形成而增加。

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