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Applying Hafnia Mixtures to Enhance the Laser-Induced Damage Threshold of Coatings for Third Harmonic Generation Optics

机译:应用Hafnia混合物来增强第三谐波产生光学器件的激光诱导涂层的损伤阈值

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The generation of third harmonic radiation (THG) is required for many pulsed solid-state laser applications in industry and science. In this contribution, the coatings for two necessary optical components, dichroic mirrors and nonlinear optical (NLO) crystals are in the focus of investigation. Because of the high bulk damage threshold lithium triborate (LBO) crystals are applied for this study. HfO_2/SiO_2 mixtures are employed as high refractive index material to improve the power handling capability of the multilayers. All coatings are produced by ion beam sputtering (IBS) using a zone target assembly for the deposition of material mixtures. The atomic composition and the oxidation ratio of different HfO_2/SiO_2 mixtures are analyzed by X-ray photoelectron spectroscopy (XPS). The influence of different deposition temperatures and post annealing on the optical properties and the amorphous micro structure of the films is investigated by UV/Vis/NIR spectroscopy and X-ray diffraction (XRD). The laser induced damage thresholds at 355 nm wavelength for nanosecond pulse durations are measured in a 10,000onl experiment according with the standard ISO21254. Furthermore, the optical components are tested under real application conditions.
机译:工业和科学中的许多脉冲固态激光器应用都需要生成三次谐波辐射(THG)。在这一贡献中,用于研究两个必需的光学组件(二向色镜和非线性光学(NLO)晶体)的涂层成为了研究的重点。由于高的整体破坏阈值,三硼酸锂(LBO)晶体被用于本研究。 HfO_2 / SiO_2混合物被用作高折射率材料,以改善多层的功率处理能力。所有涂层均使用区域靶组件通过离子束溅射(IBS)进行生产,以沉积材料混合物。通过X射线光电子能谱(XPS)分析了不同的HfO_2 / SiO_2混合物的原子组成和氧化率。通过UV / Vis / NIR光谱和X射线衍射(XRD)研究了不同沉积温度和后退火对膜的光学性能和非晶微结构的影响。根据标准ISO21254,在10,000onl实验中测量了355 nm波长的激光诱导的损伤阈值(纳秒脉冲持续时间)。此外,光学组件在实际应用条件下进行了测试。

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