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Analysis of Inverse Lifetime Curves of TaOx Electron-Selective Contacts for Si Solar Cells

机译:Si太阳能电池逆寿命曲线逆寿命曲线分析Si太阳能电池的电子选择性触点

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摘要

The analysis of Auger-corrected inverse minoritycarrier lifetime as a function of excess carrier concentration can impart information about many crucial solar cell material properties including: emitter saturation current density (Jo), surface recombination velocity (SRV), Shockley-Read-Hall (SRH) recombination in the bulk, trap density, band bending, surface Fermi-level pinning, and bandgap narrowing. This work demonstrates TaOx as a potential electron selective contact and passivation layer on silicon. Increasing TaOx thickness reduces the measured upper limit of effective surface recombination velocity (Seff,UL). The minimum Seff,UL is 55 cm/s for CZ n-Si/ 30 nm TaOx interfaces. Seff,UL increases for Si / TaOx / ITO structures due to unfavorable band bending.
机译:作为多余载流子浓度的函数的螺旋校正逆少量载波寿命的分析可以赋予许多关键太阳能电池材料特性的信息,包括:发射极饱和电流密度(J),表面重组速度(SRV),震荡读音室(SRH)重组在散装中,陷阱密度,带弯曲,表面费米级固定和带隙变窄。这项工作展示了陶 x 作为硅的潜在电子选择性接触和钝化层。增加陶 x 厚度降低了测量的有效表面重组速度的上限(S. eff, ul 最小的S. eff, ul 为CZ N-Si / 30 nm Tao为55厘米/秒 x 接口。 S. eff, ul Si / Tao的增加 x / ITO结构由于不利的带弯曲。

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