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Barrier Properties of Ultra High Barrier Coating Prepared by Roll to Roll PECVD Process and Analysis of Gas Leakage Mechanism

机译:辊对PECVD法制备超高阻隔涂层的阻隔性能及漏气机理分析

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SiOx transparent ultra high barrier coating up to 1000nm was prepared by roll-to-roll PECVD system on Planelized PEN substrate, and its barrier property was measured by Calcium test. The result demonstrated WVTR of 1.7×10~(-5)g/m~2/day. And the detailed analysis of gas leakage was made by a cross-sectional TEM observation of the point of water leakage. This observation revealed a localized crack in the SiOx coating, and this cracks was suggested to be initiated by a particle, which had a similar composition as the SiOx barrier coating.
机译:通过辊对辊式PECVD系统在Planelized PEN基板上制备了SiOx透明超高阻隔涂层,涂层厚度达1000nm,并通过钙测试测量了其阻隔性能。结果表明,WVTR为1.7×10〜(-5)g / m〜2 /天。并通过对漏水点的横截面TEM观察,对漏气进行了详细分析。该观察结果揭示了SiOx涂层中的局部裂纹,并且该裂纹被认为是由与SiOx阻挡层涂层具有相似组成的颗粒引发的。

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