A novel mechanism to give photosensitivity to engineering plastics: Reaction development patterning

摘要

We have developed a novel mechanism, reaction development patterning (RDP), to give photosensitivity to polyimides and other engineering plastics. RDP-based pattern formation utilizes change in solubility caused by nucleophilic acyl substitution between carboxylic-acid derivatives in a polymer chain and nucleophiles in a developer during development process. Thus, by using RDP, photosensitivity can be given to various soluble polyimides, polycarbonates and polyesters, including commercially available polyetherimide (Ultem) and poly(bisphenol A carbonate).