首页> 外文会议>International conference on digital manufacturing automation >An Improved Edge Extraction Algorithm for Lithography Micrographs
【24h】

An Improved Edge Extraction Algorithm for Lithography Micrographs

机译:一种改进的光刻显微图像边缘提取算法

获取原文

摘要

For shape error analysis and correction of micro-structure in lithography, image edges should be extracted from micrographs of the structures.First several basic image edge detection algorithms are analyzed and compared.Then according to the unique conditions of micrographs in lithography experiments, an improved image edge extraction method is investigated.In this method Canny operator is selected as a basic algorithm, while the mathematical morphology is used in pre-processing for de-noising to reduce the uneven phenomenon.And an appropriate enhancement algorithm is used to enhance image contrast.Experimental results show that this method can extract the image edge from the micro-structure graphs effectively.
机译:对于光刻中的形状误差分析和微结构的校正,应从结构的显微照片中提取图像边缘,首先分析并比较几种基本的图像边缘检测算法,然后根据光刻实验中显微照片的独特条件,进行改进研究了图像边缘提取方法,该方法选择Canny算子作为基本算法,而数学形态学则在预处理中进行去噪以减少不均匀现象,并采用适当的增强算法来增强图像对比度实验结果表明,该方法可以有效地从微观结构图中提取出图像边缘。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号