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Low Operation Voltage Transfer Mold Field Emitter Arrays by Plasma Treatment using Vacuum In-situ Fabrication and Evaluation Method

机译:低运行电压传递模具现场发射极阵列通过真空原位制造和评价方法进行等离子体处理

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Transfer Mold field emitter arrays (FEAs) have been developed by the combination of plasma treatment method and vacuum in-situ emitter fabrication and evaluation method to realize the stable emission characteristics and low operation voltage field emission displays (FEDs) and field emission lamps (FELs). Transfer Mold Ni-FEAs have been fabricated by coating thin Ni film on Ni FEAs in the vacuum in-situ fabrication and evaluation system to reproduce clean surface of Ni FEAs. Turn-on field of Transfer Mold Ni-FEAs fabricated by the vacuum in-situ fabrication and evaluation method was 13.3 V/μm. Then, the Transfer Mold Ni-FEAs after the exposures under air ambient environment were treated by hydrogen plasma using vacuum in-situ fabrication and evaluation system. Field emission characteristics of Transfer Mold Ni-FEAs into the evaluation chamber without vacuum breaking were evaluated as a function of hydrogen plasma treatment time. The turn-on fields of Transfer Mold Ni-FEAs under air ambient environments increased from 13.3 to 34.3 V/μm because of forming the oxidized material on surface of Ni-FEAs. However, by the hydrogen plasma treatment during 60 sec, turn-on fields decreased to 15.9 V/μm and this value was almost close to the value of Transfer Mold Ni-FEAs fabricated by the vacuum in-situ process, because of removing the oxidized material on the surface of Transfer Mold Ni-FEAs under air ambient environment. Therefore, the vacuum in-situ emitter fabrication and evaluation method combined by the plasma treatment is one of the most important factors to realize the FEDs and FELs having the reliable and stable emission characteristics.
机译:发射器阵列(FEAS)转印模领域已经开发了通过等离子体处理方法和真空的组合原位发射器的制造和评价方法,实现稳定的发光特性和低操作电压场致发射显示器(FED)和场致发射灯(自由电子激光器)。通过在真空原位制造和评估系统中涂覆薄Ni薄膜在Ni令人肥料上涂覆薄Ni膜来制造转移模具Ni-Sa。真空原位制造和评价方法制造的转移模具Ni-FEA的开启领域为13.3V /μm。然后,通过使用真空原位制造和评估系统,通过氢等离子体处理在空气环境环境下的曝光之后的转移模具Ni-FEA。作为氢等离子体处理时间的函数,评价将转移模具Ni-FeS进入评价室的场发射特性。下空气的周围环境的导通转移模具的Ni-FEAS的领域从13.3增加到因为形成在Ni-FEAS的表面被氧化的材料的34.3 V /微米。然而,通过60秒时的氢等离子体处理,导通字段降低到15.9 V /微米,并且该值是几乎接近转印模的Ni-FEAS的值由真空原位工艺制造,因为除去氧化的,在空气环境环境下转移模具Ni-BES表面的材料。因此,通过等离子体处理结合的真空原位发射器制造和评估方法是实现具有可靠稳定的排放特性的美联储和纤维的最重要因素之一。

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