Self-assembly of Uniform Nano Pores for Polystyrene-b-poly Ethylene Oxide Membrande Transfer to Silicon

摘要

Approximately 13% of the US total national energy consumption is from separation. Our project plans to eliminate the heating process, which accounts for majority of the current energy consumption in separation. This project focuses on the creation of Nano pores using a block copolymer network. The network self assembles into the pores because they are thermodynamically favored to be in this position. This comes about while being thermally annealed in a nitrogen-purged environment. Once a network is created ethanol reconstruction will cause the minority block to become a hole on the Nano scale. Once the pores have been made Oxygen plasma etching removes the polymer in the bottom of the holes all the way to the silicon substrate that the BCP is initially coated on. The Nano pores shapes are then transferred onto the silicon substrate using silicon cryogenic etching. The post etch product will be used for solvent resistant filtration.