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XPS study on microporous surface composition of microchannel plates

机译:XPS研究微通道板的微孔表面成分

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X-ray photoelectron spectroscopy (XPS) was used to study the microporous surface elements change in content and chemical states of microchannel plates before and after hydrogen reduction. The results show that the oxygen charge states include mixture of bridging oxygen (BO), non-bridging oxygen (NBO), and hydrogen oxide (-OH), and BO is the main charge state, that Si, Pb and Bi are also bonded with F to produce fluoride except bonding with oxygen before hydrogen reduction. After hydrogen reduction, the binding state of O and Si unchanged. The [BO] and [NBO] decrease, and [OH] increases obviously. Si fluoride reacts with H_2O and produces amounts of ≡Si-O- at high temperature. The lead exists in mixture of Pb° and Pb~(2+), and the Bi mainly exists in bond of Bi° in surface region of the reduced samples. The signals of K2p and Nals emerged again in the reduced samples. It is the change in content and chemical states of microchannel plates after hydrogen reducing processing that the secondary electron emission yield after reduction is 1.5 times higher than that of samples before reduction, and the bulk resistivity obviously drops by 3~4 order.
机译:利用X射线光电子能谱(XPS)研究了氢还原前后微通道板中微孔表面元素含量和化学状态的变化。结果表明,氧的电荷态包括桥键氧(BO),非桥键氧(NBO)和氧化氢(-OH)的混合物,BO是主电荷态,Si,Pb和Bi也键合与F生成氟化物,除了在还原氢之前与氧键合外。氢还原后,O和Si的结合状态不变。 [BO]和[NBO]降低,[OH]明显升高。氟化硅与H_2O反应并在高温下产生大量≡Si-O-。铅存在于Pb°和Pb〜(2+)的混合物中,而Bi主要存在于还原样品表面区域的Bi°键中。 K2p和Nals的信号在减少的样本中再次出现。还原后的二次电子发射产率是还原前的样品的1.5倍,这是氢还原处理后微通道板含量和化学状态的变化,其体电阻率明显下降了3〜4个数量级。

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