首页> 外文会议>European Photovoltaic Solar Energy Conference and Exhibition >UP TO 20 EFFICIENT SOLAR CELLS ON MONOCRYSTALLINE SILICON WAFERS BY USING A KOH – HIGH BOILING ALCOHOL (HBA) TEXTURING SOLUTION
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UP TO 20 EFFICIENT SOLAR CELLS ON MONOCRYSTALLINE SILICON WAFERS BY USING A KOH – HIGH BOILING ALCOHOL (HBA) TEXTURING SOLUTION

机译:通过使用KOH –高沸点酒精(HBA)织构解决方案,在单晶硅晶片上获得高达20%的高效太阳能电池

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We have textured (100) p-type Czochralski (Cz) monocrystalline Silicon (Si) wafers by using anaqueous solution of potassium hydroxide (KOH) and a High Boiling Alcohol (HBA). Cz-Si wafers textured with theKOH-HBA solution were processed into solar cells via the standard industrial screen printing method and anadvanced industrial process (selective emitter process). Also, high quality float zone (FZ) Si material was texturedand processed into solar cells by using a lab-type cell process. Industrially processed cells achieve efficiencies of17.6% and 18.2%, respectively. Lab-type processed cells (2×2 cm~2) achieve an efficiency of up to 20%. In addition,for the standard KOH-Isopropyl alcohol (IPA) etching solution a new etching bath setup has been developed. Thenew bath setup allows the recuperation of IPA during the texturisation process, as well as vacuum processing stepsduring the texturisation, which considerably reduces etching time.
机译:我们已经使用以下方法织构了(100)个p型切克劳斯基(Cz)单晶硅(Si)晶片 氢氧化钾(KOH)和高沸点醇(HBA)的水溶液。 Cz-Si晶片的纹理 通过标准的工业丝网印刷方法将KOH-HBA溶液加工成太阳能电池 先进的工业工艺(选择性发射极工艺)。同样,高质量的浮区(FZ)硅材料也经过了纹理化处理 并通过实验室型电池工艺将其加工成太阳能电池。工业处理的电池可达到以下效率 分别为17.6%和18.2%。经过实验室处理的细胞(2×2 cm〜2)的效率高达20%。此外, 对于标准的KOH-异丙醇(IPA)蚀刻溶液,已经开发了一种新的蚀刻浴装置。这 新的熔池设置允许在变形过程以及真空处理步骤中对IPA进行再生 在变形过程中,这大大减少了蚀刻时间。

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