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Electrode and Electrolyte Layers for Solid Oxide Fuel Cells Applied by Physical Vapor Deposition (PVD)

机译:通过物理气相沉积(PVD)应用于固体氧化物燃料电池的电极和电解质层

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Physical vapor deposition (PVD) technologies allow for a variety of microstructural morphologies. PVD is especially qualified for the production of dense ceramic layers at comparatively moderate substrate temperatures. This paper discusses the physical vapor deposition of SOFC functional layers, comprising perovskites, NiO/8YSZ and composite electrolyte layers, with a thickness between 300 nanometres and several micrometres and lateral dimensions of 100 mm-100 mm. Magnetron sputtering and electron beam evaporation were used as PVD techniques, with and without additional ion bombardment of the layers during deposition. Scanning electron microscopy analysis revealed that an additional ion bombardment during layer growth increasingly promotes the creation of continuous and dense layer morphology instead of a columnar microstructure.
机译:物理气相沉积(PVD)技术可实现多种微观结构形态。 PVD特别适合在相对中等的基板温度下生产致密陶瓷层。本文讨论了SOFC功能层的物理气相沉积,该功能层包括钙钛矿,NiO / 8YSZ和复合电解质层,厚度在300纳米至几微米之间,横向尺寸为100 mm至100 mm。磁控溅射和电子束蒸发被用作PVD技术,在沉积过程中,在有无离子轰击层的情况下,都可以进行轰击。扫描电子显微镜分析显示,在层生长过程中进行的另一次离子轰击越来越促进了连续而致密的层形态的产生,而不是柱状微观结构的形成。

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