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Regularization of pattern formation in metal/SMP bi-layer structures

机译:金属/ SMP双层结构中图案形成的规则化

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摘要

In this paper, we demonstrate a fabrication method for ordered self-assembly using pre-programmed shape memory polymer (SMP) as the substrate in an organic-inorganic bi-layer structure. By heating the hybrid structure above the SMP's shape recovery temperature, the substrate expands because of positive CTE in one direction, while in the perpendicular direction it shrinks due to shape memory effect overpowering thermal expansion. Consequently, the thin film is subjected to an orthogonal compression-tension stress field and forms unidirectional wavy patterns. We further validate our conceptual design by adjusting the strain level of pre-programmed SMP substrates. The present study is expected to offer a convenient and simple path of fabricating unidirectional wavy patterns. Moreover, selective growth and ordering of patterns can become possible. thin film, shape memory polymer (SMP), wrinkles, anisotropic patterns
机译:在本文中,我们演示了一种使用预编程形状记忆聚合物(SMP)作为有机-无机双层结构中的基底进行有序自组装的制造方法。通过将混合结构加热到SMP的形状恢复温度以上,基板会在一个方向上由于正CTE而膨胀,而在垂直方向上则由于形状记忆效应而克服了热膨胀,从而使基板收缩。因此,薄膜受到正交的压缩-拉伸应力场并形成单向波浪状图案。我们通过调整预编程的SMP基板的应变水平进一步验证了我们的概念设计。预期本研究将提供一种方便且简单的制造单向波浪形图案的途径。此外,图案的选择性生长和排序可能成为可能。薄膜,形状记忆聚合物(SMP),皱纹,各向异性图案

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