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Understanding the memory window in 1T-FeFET memories: a depolarization field perspective

机译:了解1T-FEFET存储器中的内存窗口:去极化字段透视图

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We present a physics-based prediction of the progressive VTH shift on fabricated Si:HfO2-FeFETs during Incremental Step Pulse Programming, with the help of our in-house, hardware-validated FeFET compact model. Our study confirms that the depolarization field across the FE layer strongly constrains the retained polarization in the gate stack after the programming waveform stops, which constitutes a fundamental, self-limiting effect on the attainable memory window in multidomain FeFETs. An extensive sensitivity study based on the model suggests that for a 9.5 nm-thick FE layer, decreasing the mean negative coercive field from −1.0 MV/cm to −1.5 MV/cm improves the MW from 0.75 V to 1.07 V, thus effectively alleviating detrimental impact of the depolarization field.
机译:我们提出了基于物理的渐进诉的预测 th 转向制造的SI:HFO 2 - 借助我们内部硬件验证的FEFET Compact模型,请在增量步骤脉冲编程期间进行排放。 我们的研究证实,在编程波形停止之后,Fe层跨越Fe层的去极化场强烈地限制了栅极堆栈中的保留极化,这构成了对多畴FEFET中可达到的存储窗口的基本,自限效果。 基于该模型的广泛敏感性研究表明,对于9.5nm厚的Fe层,将平均负矫顽面降低到-1.0 mV / cm至-1.5 mV / cm,从0.75 V到1.07 V,从而有效缓解 去极化场的有害影响。

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