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Achievement of 16 milestone with 30cm×30cm-sized CIS-based thin-film submodules

机译:30cm×30cm尺寸的基于CIS的薄膜子模块实现了16%的里程碑

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The efficiency of 16.03% on a 30cm×30cm-sized Cu(In,Ga)(Se,S)2 (CIS)-based thin-film circuit was achieved by review of its design for absorber layer. Increase in a CIS-based absorber thickness confirms enhancement of short-circuit current density. In this study, we report that it is critical to understand the correlation between the film thickness of the absorber and sulfurization degree to improve the efficiency. It has been found that by optimizing the sulfurization degree as a function of the film thickness of a precursor layer, the carrier concentration and crystal growth are enhanced through an improved diffusion of gallium. From electron-back scattering diffraction maps and electron beam induced current profile analyses, it is confirmed that improvement in the crystallinity of the CIS-based absorber and extension of the space charge region by increased severity of sulfurization degree for thicker precursor layer. These results lead to the progress of improvement in the conversion efficiency.
机译:通过审查其吸收层设计,在30cm×30cm尺寸的Cu(In,Ga)(Se,S) 2 (CIS)薄膜电路上实现了16.03%的效率。基于CIS的吸收体厚度的增加证实了短路电流密度的提高。在这项研究中,我们报告至关重要的是了解吸收器的薄膜厚度与硫化程度之间的关系以提高效率。已经发现,通过根据前驱体层的膜厚度优化硫化程度,可以通过改善镓的扩散来提高载流子浓度和晶体生长。从电子背散射衍射图和电子束感应电流曲线分析,可以确定,通过增加较厚的前驱体层的硫化程度,可以改善CIS基吸收剂的结晶度并扩大空间电荷区。这些结果导致转化效率提高的进展。

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