Measurements of spatial distribution of the intensity of radiation of different ionization sates of copper (CuI, CuII и CuIII) in a short (8 mm length) low-current vacuum arc with copper electrodes were carried out. The arc current I = 60 A = Is (Is - average current per cathode spot). That is, an arc with a single spot was investigated. The spatial and temporal resolutions are, respectively, 0.5 mm and 50 µs. Induction of the external axial magnetic field 0 ≤ B ≤ 0.1 T. The investigations showed that the state of the plasma and the shape of the channel of the short arc are determined not only by cathode process. In the near-anode region of the arc, changes take place both inside the channel and in the “coat” of low ionized plasma surrounding the arc. Interaction of high-speed ions of the cathode spot plasma jet with the anode forms a flow of atoms from that part of the surface to which the arc is attached. The atoms are ionized in the immediate vicinity of its surface. This increases the plasma concentration and decreases the average charge of ions in the near-anode part of the arc, in comparison with the average charge of the cathode spot plasma jet.
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机译：在带有铜电极的短（8 mm长）低电流真空电弧中，测量了不同电离态的铜（CuI，CuII和CuIII）的辐射强度的空间分布。电弧电流I = 60 A = Is（Is-每个阴极点的平均电流）。即，研究了具有单个斑点的电弧。空间和时间分辨率分别为0.5 mm和50 µs。外部轴向磁场的感应度0≤B≤0.1T。研究表明，等离子体的状态和短电弧通道的形状不仅取决于阴极工艺。在电弧的近阳极区域，通道内部和围绕电弧的低电离等离子体的“涂层”都发生了变化。阴极点等离子体射流的高速离子与阳极的相互作用形成了一个原子流，该原子流从与电弧相连的那部分表面开始。原子在其表面附近被电离。与阴极点等离子体射流的平均电荷相比，这增加了等离子体浓度，并降低了电弧近阳极部分中离子的平均电荷。
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