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Electrical and optical properties of well-aligned Al doped ZnO nanorod arrays annealed at different temperatures

机译:在不同温度下退火的取向良好的Al掺杂ZnO纳米棒阵列的电学和光学性质

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Hexagonal Al doped ZnO nanorod arrays have been prepared via a simple low-temperature sonicated sol-gel immersion method on Al doped ZnO nanoparticle thin film coated glass substrates. The nanorod arrays were annealed at the temperatures between 300 to 500 °C in ambient. The properties of the nanorods have been investigated using field-emission microscope (FESEM), X-ray diffractometer (XRD), photoluminescence (PL) spectrofluorometer and current-voltage (I–V) measurement system. It was found that the electrical resistivity of the sample decreased with annealing temperatures from 2920 Ωcm (as-grown) to 58 Ωcm (500 °C). The ratio of ultraviolet (UV) emission peak to visible emission peak of the samples as measured using PL spectrofluorometer also improved at higher annealing temperature. These trends indicate annealing process plays important role to diffuse Al dopant in the ZnO lattice and improves the electrical and optical properties of the nanorod arrays.
机译:通过简单的低温声波溶胶-凝胶浸没法在掺铝的ZnO纳米颗粒薄膜涂覆的玻璃基板上制备了掺铝的六角形ZnO纳米棒阵列。纳米棒阵列在环境中在300到500°C之间的温度下退火。使用场发射显微镜(FESEM),X射线衍射仪(XRD),光致发光(PL)荧光分光光度计和电流-电压(IV)测量系统对纳米棒的性能进行了研究。发现样品的电阻率随着退火温度从2920Ωcm(生长时)降低到58Ωcm(500°C)而降低。在较高的退火温度下,使用PL分光荧光计测得的样品的紫外(UV)发射峰与可见发射峰之比也得到了改善。这些趋势表明,退火过程对于在ZnO晶格中扩散Al掺杂剂并改善纳米棒阵列的电学和光学性质起着重要作用。

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