首页> 外文会议>Proceedings of the 42nd Annual IEEE/ACM International Symposium on Microarchitecture >ZerehCache: Armoring cache architectures in high defect density technologies
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ZerehCache: Armoring cache architectures in high defect density technologies

机译:ZerehCache:在高缺陷密度技术中增强缓存体系结构

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Aggressive technology scaling to 45nm and below introduces serious reliability challenges to the design of microprocessors. Large SRAM structures used for caches are particularly sensitive to process variation due to their high density and organization. Designers typically over-provision caches with additional resources to overcome the hard-faults. However, static allocation and binding of redundant resources results in low utilization of the extra resources and ultimately limits the number of defects that can be tolerated. This work re-examines the design of process variation tolerant on-chip caches with the focus on flexibility and dynamic reconfigurability to allow a large number defects to be tolerated with modest hardware overhead. Our approach, ZerehCache, combines redundant data array elements with a permutation network for providing a higher degree of freedom on replacement. A graph coloring algorithm is used to configure the network and find the proper mapping of replacement elements. We perform an extensive design space exploration of both L1/L2 caches to identify several Pareto optimal ZerehCaches. For the yield analysis, a population of 1000 chips was studied at the 45nm technology node; L1 designs with 16% and an L2 designs with 8% area overheads achieve yields of 99% and 96%, respectively.
机译:积极的技术扩展到45nm及以下,对微处理器的设计提出了严峻的可靠性挑战。由于其高密度和组织性,用于高速缓存的大型SRAM结构对过程变化特别敏感。设计人员通常会通过额外的资源来超额配置缓存,以克服硬故障。但是,冗余资源的静态分配和绑定导致额外资源的利用率低,最终限制了可以容忍的缺陷数量。这项工作以灵活性和动态可重新配置性为重点,重新审查了容忍过程变化的片上高速缓存的设计,以允许使用适度的硬件开销来容忍大量缺陷。我们的方法ZerehCache将冗余数据阵列元素与置换网络相结合,以提供更高的更换自由度。图着色算法用于配置网络并找到替换元素的正确映射。我们对两个L1 / L2缓存进行了广泛的设计空间探索,以识别多个Pareto最佳ZerehCache。为了进行成品率分析,在45nm技术节点上研究了1000个芯片的数量。面积开销为16%的L1设计和面积开销为8%的L2设计分别实现了99%和96%的良率。

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