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TEXTURE OF RAPIDLY SOLIDIFIED CU THIN FILMS STUDIED BY SEM EBSD AND TEM

机译:SEM EBSD和TEM研究的快速固化铜薄膜的纹理

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We have used transmission electron microscopy (TEM) and scanning electron microscopy (SEM) to analyze the microstructure in polycrystalline 220nm thick copper thin film after laser melting and rapid lateral solidification. The microstructure consisted predominantly of directionally solidified grains up to 22 μm long and about 1 μm wide. We identify four solidification zones, corresponding to occlusion, columnar growth, defective growth, and nucleation. A <100> preferred orientation in the vicinity of the average growth direction in the columnar growth zone has been identified.
机译:我们已经使用透射电子显微镜(TEM)和扫描电子显微镜(SEM)分析了激光熔化和快速横向凝固后220nm厚的多晶铜薄膜的微观结构。微观结构主要由定向凝固的晶粒组成,晶粒长至22μm,宽约1μm。我们确定了四个凝固区,分别对应于咬合,柱状生长,缺陷生长和成核。已经确认在柱状生长区中平均生长方向附近的<100>优选取向。

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