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Electro less deposition and structuring of silver electrodes inside closed micro fluidic channels

机译:封闭微流体通道内银电极的无电沉积和结构化

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This paper presents a method to deposit and structure silver electrodes inside capillaries made by silicon micromachining and oxidation for applications such as dispensing and electro-chemically sensing liquids. The electrode deposition was performed after having micro fabricated the capillaries. To increase the adhesion between the metal and the SiO_2 capillary, an intermediate layer of 3-mercaptopropylmethyldimethoxysilane (3-MPS) was deposited out of the vapor phase. The used electro-less silver plating (ELSP) solution consisted of a modified Tollens' reagent. The structuring of the electrodes was achieved by stopping the ELSP solution from completely filling the capillary by means of micro fluidic stop valves.
机译:本文提出了一种在通过硅微机械加工和氧化制成的毛细管内沉积和构造银电极的方法,用于诸如点胶和电化学感应液体的应用。在微制造毛细管之后进行电极沉积。为了增加金属与SiO_2毛细管之间的附着力,在气相中沉积了3-巯基丙基甲基二甲氧基硅烷(3-MPS)的中间层。所用的化学镀银(ELSP)溶液由改良的Tollens'试剂组成。电极的结构是通过使用微流体截止阀阻止ELSP溶液完全充满毛细管而实现的。

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