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Electrodeposition of Nanocrystalline CoNiFe Thin Films Prepared by Cyclic Voltammetry

机译:循环伏安法电沉积纳米晶CoNiFe薄膜

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The electroplating behavior of nanocrystalline CoNiFe soft magnetic thin film with high saturation magnetic flux density and low coercivity was investigated using cyclic voltammetry and chronoamperometry methods in conjunction with the scanning electron microscopy (SEM/EDX) and X-ray diffraction (XRD) techniques. The results show that, the co-deposition of CoNiFe alloy behaves anomalously. And the nucleation/growth process of CoNiFe ternary alloy followed 3D instantaneous mechanism at higher potentials, while in the case of lower potentials it followed 3D progressive mechanism.
机译:利用循环伏安法和计时电流法结合扫描电子显微镜(SEM / EDX)和X射线衍射(XRD)技术研究了具有高饱和磁通密度和低矫顽力的纳米CoNiFe软磁薄膜的电镀行为。结果表明,CoNiFe合金的共沉积行为是异常的。 CoNiFe三元合金的成核/生长过程在较高电势下遵循3D瞬时机制,而在较低电势的情况下,其遵循3D渐进机制。

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