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Electrical Property Characterization of Plasma Sprayed Polycrystalline Silicon

机译:等离子喷涂多晶硅的电性能表征

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Silicon-based materials have been widely applied in industrial fields, such as microelectronic and solar power, for the specific electronic properties. In the present work, free-standing thick silicon coatings were fabricated by air plasma spraying (APS) and vacuum plasma spraying (VPS) technologies. The microstructure and electrical property of the coatings were characterized. It was found that the electrical resistance of APS-Si coating was higher than that of VPS-Si coating. The impedance spectroscopy results showed there was significant difference in impedance curves of APS-Si and VPS-Si coatings. The grain boundary semicircle appeared in the plot of VPS-Si coating, while did not appeared in that of APS-Si coating. It was thought that the electrical property difference of the two kind coatings was related with the oxidation and microstructure difference of the coatings.
机译:硅基材料因其特定的电子性能已广泛应用于工业领域,例如微电子和太阳能。在当前的工作中,通过空气等离子体喷涂(APS)和真空等离子体喷涂(VPS)技术制造了独立的厚硅涂层。表征了涂层的微观结构和电性能。发现APS-Si涂层的电阻高于VPS-Si涂层的电阻。阻抗谱结果表明,APS-Si和VPS-Si涂层的阻抗曲线存在显着差异。晶界半圆出现在VPS-Si涂层的图中,而没有出现在APS-Si涂层的图中。认为这两种涂层的电性能差异与涂层的氧化和微观结构差异有关。

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