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Deposition of ISZO films on polymer substrate using two cathodes

机译:使用两个阴极在聚合物基材上沉积ISZO膜

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The electrical, optical and mechanical properties were investigated for the In-Sn-Zn-O films deposited using ITO and ZnO targets, without substrate heating. Three types of ITO target, which are 90wt.% In_2O_3 : 10wt.% SnO_2, 93wt.% In_2O_3 : 7wt.% SnO_2, and 95wt.% In_2O_3 : 5wt.% SnO_2, were used. The power of DC cathode equipped ITO target was fixed at 70W and the power of RF cathode equipped ZnO target was changed from 20W to 60W. The lowest resistivity (2.95×10~(-4) Dem) was obtained for the In-Sn-Zn-O films deposited under DC power of 70W of ITO (93wt.% In_2O_3 : SnO_2 7wt.%) and RF power of 40W of ZnO target. It is confirmed that surface uniformity, electrical property, and mechanical durability were improved by introduction of Zn atom for all the ITO targets.
机译:在不加热衬底的情况下,研究了使用ITO和ZnO靶沉积的In-Sn-Zn-O薄膜的电,光学和机械性能。使用三种类型的ITO靶,即90wt。%的In_2O_3:10wt。%的SnO_2、93wt。%的In_2O_3:7wt。%的SnO_2和95wt。%的In_2O_3:5wt。%的SnO_2。装备有直流阴极的ITO靶的功率固定为70W,装备有射频阴极的ZnO靶的功率从20W变为60W。在70W ITO(93wt。%In_2O_3:SnO_2 7wt。%)的DC功率和40W的RF功率下沉积的In-Sn-Zn-O薄膜获得最低电阻率(2.95×10〜(-4)Dem) ZnO靶材。可以肯定的是,通过为所有ITO靶引入Zn原子,可以改善表面均匀性,电性能和机械耐久性。

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