Aluminum-doped zinc oxide (AZO) films were deposited on B270 glass substrates by ion-beam sputtering at room temperature. Al and Zn targets were simultaneously bombarded by an ion beam in order to control precisely the Al/Zn composition at oxygen partial pressure 1.0 × 10~(-4) torr. With this co-sputtering method, the refractive index can be controlled in the range of 1.98～1.81 and the extinction coefficients at 1.3 × 10~(-3) ～ 5.4 × 10~(-3). The less resistivity 9.4 ×10~(-4) Ω·cm of the AZO film can be obtained, when the film was post-annealed at temperature 125°C for one hour.
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