The carbon films prepared by the electron cyclotron resonance (ECR) sputtering method have demonstrated attractive electrochemical properties which recommend them for a variety of applications. Recently, we have found that a small addition of fluorine into the carbon films greatly improves their electrochemical performance. The SPM image of the fluorine contained films (F-ECR films) showed that the average roughness of the F-ECR films was 0.07 nm. The F-ECR films showed a wide potential window and could electrochemically decompose persistent organometallic complexes. The F-ECR films showed an excellent potential limit for negative direction compared with other carbon electrodes, such as glasslike carbon and boron-doped diamond electrode. The excellent electrochemical properties are ascribed to the change in the electronic structures of the carbon films by an addition of fluorine. However, the electronic structures of F-ECR films have not been explored in detail. Therefore, a reliable measurement of the sp~2 and sp~3 hybrid concentration in the F-ECR films is desirable for understanding the properties of the films. In this paper, further results on the electrochemical properties of the fluorine contained carbon films are presented and discussed. We also report the sp~3/sp~2 concentration ratio in the F-ECR films estimated by X-ray photoelectron spectroscopy.
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