Monitoring and managing system of equipment operation status by using detailed event log data extracted from exposure tool

摘要

In order to keep semiconductor manufacturing equipment operating stably, visualizing the basic operating status of the tools is an essential aspect of control. With the latest tools equipped with an EES (Equipment Engineering System), effective monitoring has been demonstrated through implementation of EEQA and EEQM to visualize basic operations of the tools. In this report, we explain the effectiveness of applying EES to earlier versions of exposure tools. By collecting the same data used by the latest equipment, we were able to visualize basic operations using EES through the same method employed on the latest equipment.