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Preparation of SiC Doped In-Situ MgB_2 Mono- and 7-Filamentary Wires by Continuous Tube Forming and Filling Technique

机译:连续管成型和填充技术制备SiC掺杂原位MgB_2单丝和7丝丝

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Long lengths of in-situ SiC doped MgB_2/Fe mono- filamentary wires with high critical current densities and 7- filamentary MgB_2/Nb/Cu/Fe wires with better thermal stability have been fabricated by either continuous tube forming & filling (CTFF) technique or combining both powder in tube (PIT) and CTFF process, respectively. Particular efforts were made in view of the optimization of the manufacturing and annealing processes of the wires. The as obtained wires were sintered under a vacuum furnace at different sintering temperatures and the optimized sintering of the MgB_2 wires were investigated by the analysis of optical microscope, XRD, SEM, and the transport J_c measurements. The J_c value in a 8 at.% SiC doped MgB_2/Fe mono- filamentary wire is more than 10~4 A/cm~2 at 4.2 K and a field of 11 T. While in doped 7- filamentary wire, the similar J_c value (10~4 A/cm~2) is obtained at 4.2 K and a field of 7.5 T. Moreover, the n factors are determined to be 33 and 10 at 11 T in the mono- and 7- filamentary MgB_2 wires with SiC doping, respectively, indicating the possibility to use the as fabricated MgB_2 wires in the persistent mode for fields from 0.5 T to 10 T at 4.2 K.
机译:通过连续管成型和填充(CTFF)技术制造了长长度的具有高临界电流密度的SiC掺杂的MgB_2 / Fe单丝线和具有更好的热稳定性的7丝MgB_2 / Nb / Cu / Fe线或将管内粉末喷涂(PIT)和CTFF工艺分别结合。考虑到线的制造和退火工艺的优化,做出了特别的努力。将所获得的线材在真空炉中在不同的烧结温度下进行烧结,并通过光学显微镜,XRD,SEM和传输J_c分析研究了MgB_2线材的最佳烧结。掺杂8at。%SiC的MgB_2 / Fe单丝焊丝的J_c值在4.2 K和11 T的磁场下大于10〜4 A / cm〜2。而在掺杂7丝焊丝中,相似的J_c在4.2 K和7.5 T的电场下获得了10〜4 A / cm〜2的电阻值。此外,在含SiC的MgB_2单丝和7丝MgB_2导线中,n因子在11 T下确定为33和10。掺杂分别表明在4.2 K时从0.5 T到10 T的场在持久模式下使用制成的MgB_2导线的可能性。

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