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The new route process of V_3Ga mono-cored and multifilamentary wires using high Ga content Cu-Ga compound and V matrix precursor

机译:使用高Ga含量的Cu-Ga化合物和V基体前体的V_3Ga单芯和复丝的新布线工艺

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V_3Ga compound is one of the attractive low activation materials for high magnetic field superconducting magnet in the several V-based compounds because V-based superconducting materials have shorter decay time of induced radioactivity and high field property above 20 T. V_3Ga compound has not only high upper critical magnetic fields (H_(c2)) above 20 T as well as Nb_3Sn but also better mechanical property. However, the present critical current density (J_c) property of V_3Ga compound wire is insufficiency to apply for large high field magnet such as fusion application. In the previous study, V_3Ga compound wire was mainly investigated "Diffusion process" between Cu-Ga solid solution matrix within 20 at% Ga composition and V filament. Recently, we investigated the new route PIT process using high Ga content Cu-Ga compound to fabricate V_3Ga mono-cored and multifilamentary wires in order to increase a volume fraction of synthesized A15 phase. It was confirmed that the thicker V_3Ga layer formed along the boundary of Cu-Ga powder core and V matrix compared with previous diffusion processed samples in the case of the both mono-cored and mltifilamentary wires. And H_(c2) property of the samples using high Ga content Cu-Ga compounds was increased with increasing of Ga content into Cu-Ga compounds, and it showed about 23.0 T which value was 2.0 T higher than conventional processed samples.
机译:V_3Ga化合物是几种V基化合物中对高磁场超导磁体有吸引力的低活化材料之一,因为V基超导材料具有更短的诱导放射性衰变时间和20 T以上的高场性质.V_3Ga化合物不仅具有高于20 T的最高临界磁场(H_(c2))以及Nb_3Sn,但也具有更好的机械性能。但是,目前的V_3Ga复合导线的临界电流密度(J_c)特性不足以应用于大型的高磁场磁体,例如熔融应用。在先前的研究中,主要研究了V_3Ga复合线材,研究了含量为20 at%Ga的Cu-Ga固溶体基体与V丝之间的“扩散过程”。最近,我们研究了使用高Ga含量的Cu-Ga化合物制造V_3Ga单芯和复丝的新工艺PIT工艺,以增加合成的A15相的体积分数。可以肯定的是,在单芯线和单丝线的情况下,与先前的扩散处理样品相比,沿着Cu-Ga压粉磁芯和V基体的边界形成了更厚的V_3Ga层。使用高Ga含量的Cu-Ga化合物制成的样品的H_(c2)性能随Ga含量增加而增加,增加了约23.0 T,该值比常规加工样品高2.0T。

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