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Spectroscopic Investigation of High-Pressure Micro-Hollow Cathode Discharges

机译:高压微空心阴极放电的光谱研究

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Micro-hollow cathode discharge (MHCD), as a high-pressure glow discharge, has many applications in industry. Theclosed-MHCD is investigated experimentally in argon in the paper. The relations between breakdown voltages of glow discharge and gas pressure in argon are measured. Minimum breakdown voltages obtained, are about 520V at 200Torr argon. The differential resistivity of the voltage-current characteristics for all of the pressure studied is positive. Strong optical emission from the closed-MHCD is also observed. Measurement of electron temperature is carried out by optical emission spectroscopy. The electron temperature was about 1eV at the pressure from 200Torr to 760Torr and at the discharge current from 0.5mA to 10mA. An increase in pressure of the working gas leads to a slight decrease in electron temperature. The electron number density and gas temperature of closed-MHCD was investigated by diode laser atomic absorption spectroscopy. The gas temperature and the electron number density were evaluated from the analysis of the absorption line profiles, taking into account significant Stark broadening mechanisms. The gas temperature was found to increase with pressure from 1100K to 2100K. The electron number density was calculated from Stark broadening and shift, and it ranges from 7x10~(14) to 1.5x10~(15)cm~(-3). Thus, the closed-MHCD is similar to MHCD, which has the non-equilibrium character with the advantage of high-pressure. And it can also be used for non-thermal plasma processing e.g. surface treatment, plasma chemistry and generation of UV and VUV radiation.
机译:微空心阴极放电(MHCD)作为高压辉光放电,在工业上有许多应用。本文在氩气中对封闭的MHCD进行了实验研究。测量辉光放电的击穿电压与氩气中的气压之间的关系。获得的最小击穿电压在200Torr氩气下约为520V。对于所研究的所有压力,电压-电流特性的微分电阻率均为正。还观察到来自封闭式MHCD的强光发射。电子温度的测量通过光发射光谱法进行。在200Torr至760Torr的压力和0.5mA至10mA的放电电流下,电子温度约为1eV。工作气体的压力增加导致电子温度略有下降。采用二极管激光原子吸收光谱法研究了封闭型MHCD的电子数密度和气体温度。考虑到重要的斯塔克展宽机理,通过吸收线分布图的分析来评估气体温度和电子数密度。发现气体温度随压力从1100K升高到2100K。电子数密度是由斯塔克展宽和位移计算得到的,其范围为7×10〜(14)至1.5×10〜(15)cm〜(-3)。因此,封闭的MHCD与MHCD相似,后者具有高压的非平衡特性。并且它也可以用于非热等离子体处理,例如。表面处理,等离子体化学反应以及产生UV和VUV辐射。

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