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MOCVD-Zn1-XMgXO AS A NOVEL BUFFER LAYER FOR Cu(InGa)Se2 SOLAR CELLS

机译:MOCVD-Zn1-XMgXO作为用于Cu(InGa)Se2太阳能电池的新型缓冲层

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We prepared MgO and Zn1-XMgXO thin films by metal organic chemical vapor deposition (MOCVD)on fused silica and Cu(InGa)(SSe)2 (CIGSSe) substrates using bis-ethylcyclopentadienyl-Mg (EtCp2Mg). The growthtemperature was varied from 115°C to 160°C and it was found that MgO thin films were grown at temperatureshigher than 145°C. Zn1-XMgXO thin films with a Mg content upto 0.15 was grown at a temperature of 130°C and itsbandgap was found to be 3.57eV. The films showed the random orientation when the substrate temperatures waslower than 130°C. On the other hand, the crystal orientation changed to [100] direction when the films were preparedhigher than 145°C. Finally, Zn0.91Mg0.09O thin film was applied as a buffer layer for CIGSSe solar cell with astructure of Al-grid/ZnO:B/Zn0.91Mg0.09/CIGSSe/Mo/SLG. In the preliminary results, the solar cell efficiency wasfound to be as high as 6.5% [Voc: 388mV, Jsc: 32.7mA/cm2, F.F.: 51.8%].
机译:我们通过金属有机化学气相沉积(MOCVD)制备了MgO和Zn1-XMgXO薄膜 使用双乙基环戊二烯基-Mg(EtCp2Mg)在熔融石英和Cu(InGa)(SSe)2(CIGSSe)衬底上制备。成长 温度从115°C到160°C不等,并且发现MgO薄膜在一定温度下生长 高于145°C。在130°C的温度下生长Mg含量高达0.15的Zn1-XMgXO薄膜 带隙为3.57eV。当基材温度为时,薄膜表现出无规取向。 低于130°C。另一方面,当制备膜时,晶体取向改变为[100]方向 高于145°C。最后,将Zn0.91Mg0.09O薄膜用作CIGSSe太阳能电池的缓冲层。 栅/ ZnO的结构:B / Zn0.91Mg0.09 / CIGSSe / Mo / SLG。在初步结果中,太阳能电池的效率为 实测值高达6.5%[Voc:388mV,Jsc:32.7mA / cm2,F.F .: 51.8%]。

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