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Ramp-type Josephson junctions prepared onsuperconducting MgB2 thin films

机译:在超导MgB2薄膜上制备的斜坡型约瑟夫森结

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We report demonstration of Josephson effect on ramp-typeMgB2/AlOx/Al/Nb junctions. The MgB2 films were prepared by sequentiale-beam evaporation of boron and magnesium on buffered silicon substrateheld at room temperature, and synthesised by short post-annealing at700oC. The prepared smooth nanocryastalline films with maximal criticaltemperature Tco ≈ 36K were covered by a SrTiO3 overlayer. Ramp-edgewas patterned by ion beam etching through photoresist mask. DCmagnetron sputtering of Al and Nb was applied to complete the junctionstructure. Current-voltage characteristics and current steps at irradiation ofsamples by microwaves confirm the presence of weak link effects in thestructure.
机译:我们报告了约瑟夫森对坡道式效应的示范 MgB2 / AlOx / Al / Nb结。通过顺序制备MgB2膜 缓冲硅衬底上硼和镁的电子束蒸发 保持在室温下,并通过短时后退火 700oC。制备的具有最大临界值的光滑纳米晶薄膜 温度Tco≈36K被SrTiO3覆盖层覆盖。斜边 通过通过光致抗蚀剂掩模的离子束蚀刻来图案化图案。直流电 磁控溅射Al和Nb以完成结 结构体。辐照时的电流电压特性和电流阶跃 微波样品证实了样品中存在弱链接效应。 结构体。

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