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Feshbach resonances in Si~-,Ge~- and Sn~- negative ion photodetachment

机译:Si〜-,Ge〜-和Sn〜-负离子光解中的Feshbach共振

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A new improved study of resonance features has been made in the photodetachment process from such strong correlated system as negative ions with np~3 half-filled shells. The photodetachment cross sections from two outer shells of Si~-, Ge~- and Sn~- negative ions have been calculated with account of many electron correlations. The formation and autodetachment of the quasi-bound "nsnp~4" states revealed themselves as a very sensitive interference structure in the cross section.
机译:在光解离过程中,已经从诸如np〜3半填充壳的负离子这样的强相关系统中,对光共振过程中的共振特征进行了新的改进研究。考虑到许多电子相关性,已经计算出了Si〜-,Ge〜-和Sn〜-负离子两个外壳的光解截面。准结合的“ nsnp〜4”态的形成和自解离在截面中显示为非常敏感的干涉结构。

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