193 SLR System based on COMA - Acryl hybrid system

摘要

Cycloolefin / maleic anhydride copolymer system (COMA) is one of the promising approach to high performance single layer resist for 193nm lithography. Since hydrophilicity of the material is required for more adhesion to inorganic substrates, several acrylate monomers with hydroxyl-functionalized alicyclic pendant groups were applied into acrylate-hybrid COMA systems. The hydrophilicity of each chemical was estimated by the computer aided group contribution method. Several COMA/acrylate-hybrid polymers were synthesized by radical polymerization, and the dark film loss measurement and resin characterization experiments regarding new hybrid resins were carried out. A resist comprising an optimized hybrid polymer has shown 60nm isolated line on a 0.5 SNA micro-stepper without any optical enhancement techniques, and another resist could print 1 l0nm line/325nm pitch with >0.7μm DOF on SiON substrate.