Advances in cylindrical magnetrons

摘要

Magnetron sputtering, combined with an accurate control of process parameters and layer quality, ahs become one of the most important methods for depositing thin films. However, this coating technique suffers from some shortcomings (e.g. low target utilisation, limited sputtrer yield and plasma instabilities in reactive sputter processes) making it often suboptimal for industrial purposes. The rotating cylindrical magnetron (QCT C-MAG) overcomes most of these problems by using a stationary magnet array, located inside a raotating cylindrical target tube.