In the year 2525 if x ray is still alive if lithography can survive they may find...

摘要

Abstract: Data and discussions will be presented on the NTRM,National Technology Roadmap, for reticles based on aProcess Integration perception. Specifically two layersare considered for this paper, the gate layer which isprimarily a chrome geometry mask with a lot of openglass and a local interconnect layer which is primarilya chrome plate using clear geometries. Information fromother sources is used where appropriate and actualin-house data is used to illustrate specific points.Realizing that demands from different customers forspecific types of features tend to drive specific maskmakers and their decisions on equipment purchases andprocesses. We attempt to help predict where Integrationapproaches have either caused a lag in technologypushes or have actually speeded up certainrequirements. Discussions of integration requirements,which tend to push maskmakers, will be presented. Alongwith typical design approaches in OPC and PSM whicheither will push technology or actually slow down thetrend towards smaller geometries. In addition, datawill be presented showing how specific steppercharacteristics may actually drive the customer'scriteria, thus changing the requirements from customerto customer. !8